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    Compendium of Atomic Alkali Resistant Optical Thin Films, Diffusion and Electrical Mobility in Diode Pumped Alkali Lasers (DPALs)
    Compendium of Atomic Alkali Resistant Optical Thin Films, Diffusion and Electrical Mobility in Diode Pumped Alkali Lasers (DPALs)
    Compendium of Atomic Alkali Resistant Optical Thin Films, Diffusion and Electrical Mobility in Diode Pumped Alkali Lasers (DPALs)
    Ebook63 pages30 minutes

    Compendium of Atomic Alkali Resistant Optical Thin Films, Diffusion and Electrical Mobility in Diode Pumped Alkali Lasers (DPALs)

    By Lindsay Quarrie

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    About this ebook

    Optical Thin Films, Diode Pumped Alkali
    Laser (DPAL), Metal Oxides, Diffusion,
    Defect Formation, Polymer Assisted
    Deposition (PAD), Electrical Mobility of
    Alkali Ions, Fabry-Pérot Filters Design,
    Effects of Atomic Rubidium on the
    Performance of Optical Windows in DPALs

    LanguageEnglish
    PublisherLindsay Quarrie
    Release dateJul 30, 2018
    ISBN9781386402602
    Compendium of Atomic Alkali Resistant Optical Thin Films, Diffusion and Electrical Mobility in Diode Pumped Alkali Lasers (DPALs)
    Author

    Lindsay Quarrie

    Over 30 years of professional experience, problem solving, innovation through research, design, development, test, engineering, technology management with commercial, defense, government, university, aerospace partners. Competence and successes includes subject matter expert (SME) on hardware design and development for land, maritime, airborne and space, semiconductors, microelectronics (including ASICs, FPGA, analog, digital and mixed signal), parallel computing including CSP and transputers, radiation and nuclear effects, lasers, optics and development of thin film protection for severe environments and Aircraft, Space Life Support Systems Physiological Monitoring, On Board Oxygen Generating Systems (OBOGS). Materials development, characterization, failure analysis. The development and control of high energy density and high power density systems including battery, pulsed power, alternative energy, combined portable energy sources. Development of satellites and space systems. Survivability, vulnerability assessments for known space radiation environments. Development of Hover Airlift and Logistics Operation Guided Expeditionary (HALOGX) vertical takeoff and landing (VTOL) flying platforms. Current interests also includes Low Energy Nuclear Reactions (LENR) and high efficiency, low cost and reliable nuclear fusion techniques. Success in leading technical teams, in every stage from customer interface and program capture to hardware design, development and successful delivery and follow on. As adjunct professor at NU School of Engineering and Computing, Applied Engineering Lindsay teaches both undergraduate and graduate level courses in Electromagnetic Theory, VLSI Microelectronics Design, Electronic Circuits and Systems, Digital Logic Design, Digital Logic Design Lab, Design and Analysis of Experiments, Concurrent Design Engineering, Reliability Engineering, Senior Capstone Designs & patents, Manufacturing Design Engineering, Cybersecurity Technology, Red Teaming.

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      Book preview

      Compendium of Atomic Alkali Resistant Optical Thin Films, Diffusion and Electrical Mobility in Diode Pumped Alkali Lasers (DPALs) - Lindsay Quarrie

      CHAPTER - 1

      Effects of Atomic Rubidium on oxidized Aluminum Thin films

      Lindsay O. Quarrie¹,² , Senior Member, IEEE

      ¹New Mexico Institute of Mining and Technology, Department of Materials Engineering, 801 LeRoy Place, Socorro, NM 87801,USA

      ²Air Force Research Laboratory, AFRL/RDLC Laser CoE, 3550 Aberdeen Avenue SE, Kirtland AFB, NM 87117-5776, USA

      Abstract— Thin film layer(s) of optical materials are needed to protect the optical windows of gain cells in a Diode Pumped Alkali Laser (DPAL), from degradation due to atomic alkali vapor. A thin film of an oxide of aluminum was created by physical vapor deposition (PVD) of aluminum onto quartz microscope slides, allowing natural oxidation of the deposited aluminum thin film in air. A microscope slide with the thin film oxide of aluminum was then introduced into a DPAL gain cell emulator. In the DPAL gain cell emulator the oxidized aluminum was exposed to heat and atomic rubidium vapor. A qualitative analysis was obtained as to the suitability of a naturally oxidized thin film of aluminum, forming an oxide of aluminum, as a thin film protective barrier on the optical windows of a DPAL against hot alkali vapor.

      Keywords— Aluminum ; Laser ; Atomic; Rubidium ;Thin film; oxide; optical; DPAL

      I. INTRODUCTION

      Optical materials used to make DPAL gain cells, Perschbacher et, Hostutler, Shay[1], and optical windows, such as quartz and Pyrex®, react with atomic rubidium vapor, Ma, Kishineyski, Jau , Reuter [2]. As a result DPALs suffer from damage to their optical windows due to atomic alkali exposure, Quarrie [3] . Various mechanisms of alkali vapor damage to glass are described by Samuneva, Djambaski, and Avramova [4]. A high optical quality protective thin film is needed as a barrier to alkali vapor in DPAL gain cells. Metallic aluminum is very reactive with atmospheric oxygen. A thin passivation layer of alumina (4 nm thickness) forms in about 100 picoseconds on any exposed aluminum surface, Campbell, Kalia, Aiichiro,Vashista [5]. This layer protects the metal from further oxidation and the hypothesis is that this thin film oxide of aluminum could potentially be used without further treatment as a low cost damage resistant barrier to the rubidium vapor. Aluminum oxide is also responsible for resistance of metallic aluminum to weathering. Analysis of selection criteria such as closely matching refractive index of glass to minimize energy losses and prior experiments with bulk aluminum oxide glass shows low rubidium absorption, with the aluminum oxide glasses effectively acting as a diffusion barrier to the atomic rubidium. However the behavior of thin film aluminum as a barrier to rubidium vapor could be different and requires investigation. Physical vapor deposition by means of thermal evaporation of aluminum

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