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  • Proposed SILTERRA FOCUS MONITOR as a more convenient scanner focus monitoring method

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    Saandilian Devadas
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    The current FOCAL system is scanner focus monitoring that performed using the FOCAL test, which is time consuming (hr! as the scanner has to "e down during the test. Thus focus monitoring only performed every fortnight. The proposal method that called $ilterra focus %onitor ($F%! only re&uires one wafer to "e patterned on the scanner, then measured in any overlay tool, which indirectly converts the alignment results to focus drift results.

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    The current FOCAL system is scanner focus monitoring that performed using the FOCAL test, which is time consuming (hr! as the scanner has to "e down during the test. Thus focus monitoring only performed every fortnight. The proposal method that called $ilterra focus %onitor ($F%! only re&uires one wafer to "e patterned on the scanner, then measured in any overlay tool, which indirectly converts the alignment results to focus drift results.

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    35 views1 page

    Proposed SILTERRA FOCUS MONITOR as a more convenient scanner focus monitoring method

    Uploaded by

    Saandilian Devadas
    The current FOCAL system is scanner focus monitoring that performed using the FOCAL test, which is time consuming (hr! as the scanner has to "e down during the test. Thus focus monitoring only performed every fortnight. The proposal method that called $ilterra focus %onitor ($F%! only re&uires one wafer to "e patterned on the scanner, then measured in any overlay tool, which indirectly converts the alignment results to focus drift results.

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    © All Rights Reserved
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    Abstract: The aim of the proposal is to replace the current FOCAL, as a more convenient scanner

    focus monitoring method. The current FOCAL system is scanner focus monitoring that performed
    using the FOCAL test, which is time consuming (~hr! as the scanner has to "e down during the
    test. Thus focus monitoring only performed every fortnight. #n meanwhile, the proposal method that
    called $ilterra Focus %onitor ($F%! only re&uires one wafer to "e patterned on the scanner, then
    measured in any overlay tool, which indirectly converts the alignment results to focus drift results.
    The $F% techni&ue is "ased on the asymmetric imaging e'hi"ited "y structures that shift phase "y
    a value other than (). The "asic focus monitor pattern consists of three narrow chrome lines
    e&ually spaced. At nominal focus, the overlay error for this "ar*on*"ar structure is +ero in "oth ,
    and -. .hen a focus error e'ists, the phase*shifted half of the pattern moves relative to the
    unshifted part/ the resulting overlay error is a direct measure of the focus error. $F% is focus
    monitoring as a more convenient scanner focus monitoring method compare to other method that
    have in most of the fa"..

    Supervisor, Academic :

    Supervisor, Industry : ARIDEE BIN ARIFIN
    Member of Technical Staff, Silterra Malaysia Sdn. Bhd.
    Researcher : SAANDILIAN A/L DEVADAS
    Master's Degree : Computer Science with Major in Graphics & Multimedia
    Bachelor's Degree : Computer Science with Major in Graphics & Multimedia
    Certificate : Business Studies
    Senior Process Engineer with Infineon Technologies (Kulim) Sdn Bhd (20052009
    Senior Process Engineer with STMicroelectronics Pte !td Singa"ore (200920!!
    Senior Process Engineer II with Silterra Mala#sia Sdn Bhd (20!!"resent
    Status : Research Project title approved by Ministry of Hiher !d"cation. #ate of commencement:
    $an %&
    Siterra !aaysia Sdn" Bhd" #oa$oration %ith &i'her Learnin' Institution
    (opic : SIL(ERRA F)#*S !)NI()R +SF!,

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