You are on page 1of 3

MCU-2/P Military Mask General Facts and Information

What was the MCU-2/P and filter designed to do?


The MCU-2/P gas mask and C2/C2A1 filters were designed specifically for chemical warfare agents (CWA). In the process of protecting wearers from CWA compounds, wearers will be protected from other battlefield contaminants or industrial chemicals. The mask filters are tested against the battlefield contaminants listed in Table VII from MIL-PRF-51560B.

How does the MCU-2/P and filters work?


The high efficiency particulate air (HEPA) media portion of the filter provides greater than 99.97% filtration efficiency (N100 equivalent). Chemical agents with low vapor pressure, such as VX and CS, are removed by HEPA filtration. Biological agents, such as anthrax, as well as radioactive particulates are efficiently are also removed by this means. Organic vapors with high vapor pressure are removed by adsorption rather than filtration.

The design of the filters is effective in filtering a wide variety of industrial chemical vapors. The vapor filtration performance of this sorbent depends primarily on two factors; the vapor pressure and the reaction chemistry of the chemical. Chemicals with low vapor pressures are effectively filtered by physical adsorption alone. As a general rule of thumb, chemicals with a vapor pressure below about 10 mm Hg (at the temperature of the filter) are very effectively removed by physical adsorption in pores of the activated carbon. For vapor pressure chemicals, reaction with the impregnants is necessary for effective filtration performance. Table 1 provides a summary of the filtration mechanisms for some chemical warfare agents. TABLE 1. Mechanisms of Agent Vapor Filtration by ASZM-TEDA Carbon Agent Filtration Mechanism Nerve Strong physical adsorption, generally followed by slow hydrolysis of the adsorbed agent. Blister Strong physical adsorption, generally followed by slow hydrolysis of the adsorbed agent. Phosgene Weak physical adsorption combined with agent decomposition effected by the (choking impregnants. Phosgene hydrolyses to form hydrogen chloride and carbon agent) dioxide. The hydrogen chloride reacts with the copper and zinc carbonate Cyanogen Chloride (blood agent) impregnants to form copper and zinc chlorides. Weak physical adsorption combined with agent decomposition effected by the impregnants. Cyanogen chloride likely undergoes hydrolysis catalyzed by the triethylenediamine impregnant followed by removal of the acid breakdown products (hydrogen chloride and cyanic acid) by the copper and zinc carbonate impregnants. Some cyanic acid may hydrolyze to form carbon dioxide and ammonia. Weak physical adsorption combined with agent decomposition effected by the impregnants. Hydrogen cyanide reacts with the copper(+2) and zinc carbonate impregnants to form copper(+2) and zinc cyanides. The copper(+2) cyanide converts to cuprous cyanide and cyanogen. The cyanogen reacts with the ammonium dimolybdate impregnant likely forming oxamide, which is strongly physically adsorbed by the activated carbon. Arsine (blood agent) Weak physical adsorption combined with agent decomposition effected by the impregnants. At low relative humidity, arsine is oxidized by copper(+2) to form arsenic trioxide (As2O3) and arsenic pentoxide (As2O5). At high relative humidity, arsine is catalytically oxidized by the silver impregnant to form arsenic oxides.
4 5 4 4

Hydrogen Cyanide (blood agent)

Gas Filter uses ASC carbon for the C2 filter canister and ASZM-TEDA carbon for the C2A1 filter canister. ASC carbon is a coal-based activated carbon impregnated with chemical compounds containing copper, silver and chromium (causing the C2 canister to be disposed of as hazardous waste). ASZM-TEDA Carbon is a coal based activated carbon impregnated with copper, zinc, silver and molybdenum compounds, as well as with triethylenediamine (TEDA). The carbon has substantial meso- and macroporosity to provide for rapid internal mass transfer and to accommodate the application of the reactive impregnants.

What are the limitations of the MCU-2/P and filters?


- The chemical-biological filter canister provided with this mask does not provide protection against ammonia, carbon monoxide or acid gases (i.e. HCl, HF, HBr). Chlorine and fluorine may not be filtered. - Time before breakthrough is chemical dependant and higher vapor pressure industrial chemicals may have very short protection time. Replace the canister immediately after chemical exposure ends. - Canister is susceptible to high humidity, shortening life of the active material - Temperature range -32 F to 125 F. Excessive temperatures will accelerate material deterioration. - Long duration exposure to strong liquid solvents will damage the mask. *Contact ESOH Service Center for technical information at DSN 240-5454 (1-888232-ESOH) or Email ESOHServiceCenter@Brooks.af.mil References: MIL-PRF-51560B, "Performance Specifications Canister, Chemical - Biological Mask: C2A1", 8 July 2004. Morrison, Robert W., "Overview of Current Collective Protection Filtration Technology", Guild Associates Inc. Baltimore, MD T.O. 14P4-15-1, "Operations and Maintenance Instructions with Illustrated Parts Breakdown Chemical-Biological Mask Type MCU-2A/P MCU-2/P", 12 May 2003.

You might also like