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* Corresponding author: (Tel) +358 50 442 3469, (Fax) +358 13 251 2721
E-mail: rizwan.saleem@uef.fi, Rizwanphy@gmail.com
Abstract
Guided mode resonance (GMRF) phenomena occurs when the evanescent orders of a diffraction grating are
coupled to the waveguide modes and propagate out at given optical parameters such as wavelength, angle, and
state of polarization of incident light. The outcoupling field from a waveguide is, in general, polarization
sensitive. Polarization insensitive 1D subwavelength grating structures with high diffraction efficiency at
normal and oblique incidence are required, for example, in optical communications where output light may
possess any polarization state. This means that an s- or p-polarized input optical field, which generally couples
TE- or TM-modes in the waveguide under different resonance conditions, can be tuned at one resonance by
selecting suitable grating parameters, regardless of the input polarization state. All of the polarization insensitive
devices fabricated to date either employing a method which is not cost-effective or simple enough to some
extent. In this work, we report the design and fabrication of two types of non-polarizing binary-structured one-
dimensional (1D) GMRF at normal incidence. A single layer binary-profile TiO2 resonant grating (grating-I) is
fabricated by Atomic layer deposition (ALD), electron beam lithography (EBL) and reactive ion etching (RIE),
which demonstrates almost perfect non-polarizing filtering effect with 1D grating under normal incidence. A
double layer rectangular-profile polycarbonate-TiO2 1D GMR grating (grating-II) is fabricated by nanoimprint
lithography (NIL) and ALD which also shows good non-polarizing property and the potential of cost-effective
mass fabrication of such functional devices.
1. Introduction
Polarization insensitive diffraction gratings are highly desirable for optical communications because of the
unknown polarization state of the light emerging from optical fibers in dense-wavelength-division-multiplexing
system. Guided mode resonance filters GMRFs can be employed as the polarization insensitive gratings which
can couple TE- or TM-modes with either s- or p-polarized input optical fields. GMRF effect occurs when the
evanescent diffraction orders coupled into the waveguide mode and propagate in waveguide layer at appropriate
optical parameters such as wavelength, angle, and state of polarization of incident light. All of the polarization
independent devices fabricated to date pass through a process which is not cost-effective to some extent. For
example, total internal reflection polarization independent gratings have been fabricated in single dielectric
material with low insertion and polarization dependent loss1. Similarly high efficiency polarization independent
designed and fabricated gratings in fused silica for wideband transmission are used in chirped pulse
applications2. Narrowband polarization independent 1D guided mode resonance filters GMRFs are designed at
conical incidence for simultaneous excitation of two modes, the spectral position and width are controlled by
Advanced Fabrication Technologies for Micro/Nano Optics and Photonics VI, edited by Georg von Freymann,
Winston V. Schoenfeld, Raymond C. Rumpf, Proc. of SPIE Vol. 8613, 86130C · © 2013 SPIE
CCC code: 0277-786X/13/$18 · doi: 10.1117/12.2001692
(a) (b)
Figure 1. Schematic diagrams of the GMR (a) grating I and (b) grating II.
1
- TE-Mode
a) -TM-M odr 0.9
0.8
(b)
0.
0.6 0.
z 0.5
0.4- 0.
0.3
0.2 0.z
0.1
MO 750 800 850 900 950 1000 750 800 850 900 950 1000
A [nm] A [null
Figure 2. Simulation results of specular reflectance at normal incidence showing a resonance wavelength λr=850 nm at the
designed values of a period d, a linewidth w, and a ridge height h for both TE- and TM-modes for (a) grating I and (b)
grating II.
3. Experiment
3.1. Fabrication of non-polarizing waveguide gratings
The fabrication process of grating I is shown in Fig. 3. The process starts with the cleaning of fused silica (FS)
sample of 1ʺ and 0.5 mm in thickness with isopropanol. A high index and amorphous TiO2 film of ~200 nm is
grown on FS sample by atomic layer deposition process, using Beneq TFS 200-152 reactor using commonly
ZEP
Cr
TiO2
Si02
02 plasma cleaning
Resist removal
7
TiO2 etching
E -beam writing
Wig
02 plasma cleaning
Development
Cr etching
Si02
7.=
Cr wet etching
scaled dose of 300 μC/cm2 by Ebeam writer EBPG5000+ES HR from Vistec Lithography. The e-beam exposure
was followed by isopropanol for 30 s and finally rinsing with DI water and dry nitrogen blow. Dry chromium
etching was performed at low pressure (15 mtorr) process based on Cl2 and O2 gases together with inductively
coupled plasma (ICP) at 1500 watt by using Plasmalab 100 from Oxford Plasma Technology. The resist was
removed under O2 plasma with O2 flow of 20 sccm (standard cubic centimeter) at RF power 100 watt for 180 s
using March CS-1701 from Microtech-Chemitech AB. This process not only removes the resist and its
constituent ashes but also clean the sample thoroughly for next process. After resist removal, TiO2 etching was
performed by SF6 and Ar plasma using Plasmalab 80 from Oxford Plasma Technology. Subsequent to TiO2
etching, sample was again cleaned for any particles by O2 plasma under the same power and time using March
CS-1701. Final step was performed to remove Cr layer completely by wet Cr etching process, which was
achieved by a mixture of Ammonium cerium (IV) nitrate from Sigma-Aldrich, acetic acid and DI water for
sufficient time till the complete removal of Cr layer followed by rinsing with DI water and drying with nitrogen
blow. For the fabrication and replication of grating II, see [9]. The stamp is fabricated on Si-wafer by negative
(a)
(d)
SgnSF=1nLeee Dale 26 Mar 2012 200383 ENT= 2021v signal A= InLene Dm 28 Mn 2012
Photo No. .8436 Tame '.12 06 Map =11500 0%- 000= 3 mm Photo No.48516 Time 1] %01
Figure 4. SEM pictures of the fabricated GMR gratings. (a) Type-I grating on fused silica substrate. (b) HSQ master stamp
on Si substrate. (c) The replicated polycarbonate grating and (d) final double layer grating-II with a TiO2 cover layer of 80
nm.
i -
0.3 ;,.
0.2- 0.r
0.1- `ríFk,tvt. rtittl 0.1-
700 725 750 775 800 825 850 875 900 925 950 975 1000 950 775 800
A [um] A [nm[
Figure 5. Measured transmittance/reflectance of the fabricated GMR gratings (a) type-I and (b) type-II, demonstrating the
non-polarizing properties.
5. Conclusion
We presented design, fabrication and characterization of two types of one dimensional guided mode resonance
gratings with simple binary geometries. The two types of fabricated gratings demonstrate the polarization-
insensitive GMRs effect under normal incidence. The type-I GMR grating consist of a simple single layer TiO2
binary profile on the fused silica substrate that is fabricated by employing ALD, EBL, and RIE techniques with
almost perfect non-polarizing property. The type-II GMR grating is fabricated by nanoimprinting into the
polymer (polycarbonate) substrate followed by an over-coating of amorphous TiO2 layer by ALD. Both types of
non-polarizing GMR gratings are realized first time in experiment so far, which show the potential of low-cost
Acknowledgement
We acknowledge the financial support by the Academy of Finland, the Strategic Funding Initiative TAILOR of
the University of Eastern Finland and Higher Education Commission (HEC), Pakistan.
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