Professional Documents
Culture Documents
31-38 (2014)
DOI: 10.6180/jase.2014.17.1.05
Abstract
There has been significant interest in developing metal oxide films with high surface
area-to-volume ratio nanostructures particularly in substantially increasing the performance of
Pt/oxide/semiconductor Schottky-diode gas sensors. While retaining the surface morphology of these
devices, they can be further improved by modifying their nanostructured surface with a thin metal
oxide layer. In this work, we analyse and compare the electrical and hydrogen-sensing properties of
MoO3 nanoplatelets coated with a 4 nm layer of tantalum oxide (Ta2O5) or lanthanum oxide (La2O3).
We explain in our study, that the presence of numerous defect traps at the surface (and the bulk) of the
thin high-k layer causes a substantial trapping of charge during hydrogen adsorption. As a result, the
interface between the Pt electrode and the thin oxide layer becomes highly polarised. Measurement
results also show that the nanoplatelets coated with Ta2O5 can enable the device to be more sensitive (a
larger voltage shift under hydrogen exposure) than those coated with La2O3.
Key Words: Hydrogen, Gas Sensor, Metal Oxide, Heterostructure
1. Introduction
The rise of nanotechnology and the ability to organise and restructure matter at the nanoscale, have
brought forth the development of cheap, low-power,
miniaturized sensors with enhanced performance. As
such, hydrogen sensors are important and have become a
core component in clean and renewable energy related
instruments. Devices which convert hydrogen gas to energy, such as internal-combustion engines, turbines and
fuel cells, all require high-performance and responsive
sensors, due to the highly volatile nature of hydrogen
gas, especially when applied as a fuel [2].
*Corresponding author. E-mail: jcwyu@hku.hk, yu.jerrycw@gmail.com
32
J. Yu et al.
2. Experimental
2.1 Preparation of Substrates
The nanoplatelet MoO3 films were grown by thermal
evaporation on 6H-SiC n-type substrates (Tankeblue Co.),
the motivations behind the choice of our deposition parameters are explained in our previous work [7,8]. The native SiO2 layer was removed by etching the wafers in 10%
HF + H2O and an electrode of Ti and Pt, with thicknesses
of 40 and 100 nm, respectively were deposited on the
backside of the wafers using electron beam evaporation.
The wafers were diced into 5 5 mm2 substrates and annealed at 500 C to form the ohmic contact. A second
cleaning process was performed using the same HF process to remove the SiO2 layer from the polished side of the
substrate, which is formed during the annealing process.
Subsequently, the prepared substrates were cleansed in
acetone, isopropanol, DI water and blown dry with N2 gas.
2.2 Growth of Nanoplatelets Films
The source was prepared by weighing 10 mg of MoO3
A Comparison Study on Hydrogen Sensing Performance of MoO3 Nanoplatelets Coated with a Thin Layer of Ta2O5 or La2O3
33
34
J. Yu et al.
(2)
where A** is the effective Richardson constant; T is the
absolute temperature; q is the electron charge; fB is the
effective barrier height; VF is the forward applied voltage; h is the ideality factor; and k is Boltzmanns constant.
Using Equation (2) from the TE model, the barrier
Table 1. The sensitivity (SF) and voltage change (DV) at
100 mA, exhibited from the MoO3, La2O3/MoO3
and Ta2O5/MoO3 nanoplatelets based MIS-type
sensor diodes exposed to air and 1% diluted
hydrogen ambience at different temperatures
MoO3 [1]
T (C)
25
140
220
300
La2O3/MoO3
Ta2O5/MoO3
SF
DV (V)
SF
DV (V)
SF
DV (V)
0.74
0.22
0.53
0.07
0.03
-
0.95
1.22
3.71
7.52
0.09
0.41
0.81
1.13
0.27
2.85
9.32
9.43
0.15
0.74
1.20
1.11
Figure 4. Effective barrier height fB (as denoted by the hollow circles) and dielectric constant k (as denoted by
the filled squares) for the MoO3 nanoplatelets, with
and without La2O3 and Ta2O5 coating at different
temperatures. The thermionic emission (TE) model
is found to be dominant allowing for an accurate
calculation of the effective barrier height, from 25
C to 350 C for the uncoated MoO3 and from 25 C
to 140 C for the MoO3 with the coatings. Thus,
from 180 C to 300 C, the Poole Frenkel (PF)
mechanism is dominant, allowing for the calculation of the dielectric constant for the nanoplatelets
with La2O3 and Ta2O5.
A Comparison Study on Hydrogen Sensing Performance of MoO3 Nanoplatelets Coated with a Thin Layer of Ta2O5 or La2O3
35
and bulk traps in the thin coating layer which significantly influences the flow of current. Therefore, for simplicity we will consider these traps as defect traps and
examine the electrical properties in terms of the trap-assisted conduction mechanism (also known as Poole
Frenkel emission).
In classical mechanics, we presume that if numerous
defects are present in the thin high-k layer, charge carriers that flow in their proximity to these defects can
undergo trapping and de-trapping processes at the interface. In quantum mechanics, electrons have a probability
where they can exist inside the potential well (defect
trap) before tunneling through to the other side. With sufficient thermal energy, these traps can be thermally activated and provide carriers and alternative pathway to
flow through the energy barrier. Poole-Frenkel (PF)
emission models this behaviour quite effectively from a
classical viewpoint. In this model, the dielectric constant
(k) can be deduced from the slope of the forward bias
semi-log J-V1/2 characteristics using Equation (3) as
given by [15]:
La2O3/MoO3
Ta2O5/MoO3
1.77
1.20
1.12
1.15
1.06
5.22
4.42
3.97
4.03
3.93
3.43
5.92
4.40
4.24
4.19
4.26
4.26
(3)
where C is a proportionality constant; WT is the activation energy of the traps; E is electric field across the thin
film; k and e0 are the dielectric constant of the thin film
and the permittivity of vacuum, respectively.
MoO3 [ref]
25
140
180
220
260
300
La2O3/MoO3
Ta2O5/MoO3
Dk
Dk
053.6*
035.7*
28.8
29.6
28.2
20.7
.-4.4*
.-0.6*
1.4
1.0
0.3
1.6
064.4*
035.3*
33.0
32.1
33.2
33.1
00.6*
00.8*
0.9
1.0
1.1
1.2
36
J. Yu et al.
A Comparison Study on Hydrogen Sensing Performance of MoO3 Nanoplatelets Coated with a Thin Layer of Ta2O5 or La2O3
37
Table 4. (a) Voltage shifts, (b) response and (c) recovery time for Ta2O5 and La2O3 coated MoO3 nanoplatelet sensors
towards hydrogen with different concentrations at 220 C under 100 mA bias current
Sensor
Parameter
H2 Concentration (ppm)
600
1250
2500
5000
10000
0.13
0.14
0.27
0.22
0.51
0.41
0.79
0.61
1.07
0.85
162
156
171
170
183
168
120
102
090
075
363
558
370
432
270
588
429
582
645
912
Acknowledgements
4. Conclusions
In this work, we have presented how the addition of
Ta2O5 and La2O3 thin films substantially improves the
hydrogen sensing performance of MoO3 nanoplatelets.
By comparing their results, we establish that there is a
transition in the dominant conduction mechanism from
thermionic emission to Poole-Frenkel emission between
140 C and 180 C. By examining the changes in barrier
height and dielectric constant, we can conclude that the
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