Professional Documents
Culture Documents
Danielson et a1.
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ABSTRACT
An automatic inspection system including an illumina
tor for illuminating a reticle or photomask to be in
[22] F?ed:
Oct 5 1987
[63]
Date of Patent:
4,926,489
1983, abandoned.
356/399
[56]
References Cited
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4,926,489
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US. Patent
May 15,1990
Sheet 2 of 13
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4,926,489
FIG. 2
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Sheet 8 of 13
4,926,489
US. Patent
May 15,1990
Sheet 10 of 13
4,926,489
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US. Patent
May 15,1990
Sheet 11 of 13
4,926,489
ERROR TEST.
BEGIN AT THE
END OF SCAN i
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IF STAGE
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RESET COUNTERS
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GO TO ACC. UPDATE
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GO TO ACC. UPDATE
FIG. I 5 a
US. Patent
May 15,1990
Sheet 13 0f 13
4,926,489
seq
PIXEL sIzE
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4,926,489
ject.
4,926,489
tain corresponding data from the storage device. One 30 plate rotation, etc. There are also additional error
sources which are not common to both die, such as
disadvantage of this type of system is that the synchro
relative vibration of the two optical pick-up units (ob
nization method, comparison method and storage
jectives) or die run-out present on the plate.
method are not practical for high resolution large area
The alignment method taught by Levy uses patterns
applications like VLSI photomasks and reticles, for
35 within the die for error information and is capable of
many of the same reasons discussed above.
The known good board is ?rst scanned and the result 50 for inspecting single die reticles since there is nothing to
ing electronic representation is stored in a memory. An
compare against. With the exception of Kryger, in all
unknown board is then scanned while simultaneously
previously mentioned prior art, a known good stored
comparing the electronic representation with the stored
representation must already exist for there to be any
representation. Faults are located by performing a
thing for the system to use for comparison. Combining
point-by-point comparison of the two electronic repre 55 any of the stored data methods taught by Micka, Kurtz,
sentations. The synchronization method applied merely
or Lloyd, and even that taught by Kryger, to the appa
consists of the scanner position and memory being ad
ratus taught by Levy would require substantial redesign
dressed from the same counter. Thus, registration is
of the combined systems which is neither suggested nor
statically accomplished by insuring that the unknown
taught by any of the references. Such a combination
board is positioned in the same position as the known
would not be able to accommodate the high data vol
good board, when it was scanned. The disadvantages to
ume (as described earlier) and the even higher data rate
this system, when extended to the inspection of VLSI
requirements (as high as 20 MHz) of a system analogous .
photomasks or reticles, are the same as those mentioned
to the present inventions. Furthermore, even if it were
in the previous paragraphs regarding the Micka appara
possible to produce the stored representation at the
tus.
65
4,926,489
10
:1 pixel.
4,926,489
'
X direction.
FIG. 4 is a functional block diagram of pixel genera
tion and alignment correction circuits of the reticle
inspection operation.
30
error detection circuit that dynamically detects align 35 50, respectively. The binocular view permits viewing of
ment errors in both X and Y directions.
a magni?ed image of the reticle by an operator. The
inspection optics 42 and 44 are automatically focused by
FIG. 9 is a logic diagram of a ?rst stage of Y align
an automatic focus circuit 52, of a type corresponding
ment detection-utilized by the alignment error detection
to that disclosed in US. Pat. No. 4,247,203.
circuit of FIG. 8.
system of FIG. 1.
FIG. 17 is a diagram that illustrates the procedure of 65 62 are first-in-?rst-out (FIFO) type memory circuits
4,926,489
10
system timing control 68 provides timing signals to 10 put of each of the N photosensors is scanned L times,
thus forming the N>< L swath. A pixel is the rectangular
synchronize the optical and database representations of
fect analyzer.
The inspection station microprocessor 70 controls the
position and movement of the air-bearing stage 28
through X, Y and 0 drives 72, 74, and 76, respectively,
11
4,926,489
or photomask is inspected.
Furthermore, each swath is divided into fractional
12
verters 118 and 120, and level converters 122 and 124.
As the photosensors are scanned one at a time, the A/D
converters and the level converters output a serial
inspection.
The positions of the geometrical patterns in each
fractional swath are speci?ed by the coordinate loca
tions and slopes of their edges. During the synchronized
and simultaneous scanning of the reticle, the geometri
nected via a bus 96. A tape drive 98 and a disc drive 100
recording.
The system timing control 68 provides several timing
tation).
FIG. 4 illustrates the operation of the detection,