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Jason R. Albia
MS Materials Science and Engineering
Outline
Review
Ionization of Neutral Molecule
Ion Sources
Open and Close Ion Sources: Configuration and Application
1. Axial Ion Source
2. Lattice Ion Source
3. Crossbeam Ion Source
4. Gas-tight Ion Source
5. Sputter Process Monitor Ion Source
Review
Ionization of neutral
gas particles
Admittance of
substance to be
analyzed into the
vacuum chamber
Sorting of Particles
base on m/e
Faraday detector
or secondary
electron emitter
.
Figure 1. Component function of mass spectrometer.
E= h BE
Filament Consideration
Ion Source
General Classification
1. Open Ion Source
Ion Source
General Classification
1. Open Ion Source
Drawbacks:
Outgassing and Electron Stimulated Desorption
obscure the minimum detectable partial pressure of
gases (H2, H2O,N2, CO, and CO2).
Application
residual gas analysis in HVS due to its
open construction
ensure extremely low internal gas
emission
Cross Beam Ion Source
Ion Source
General Classification
2. Close Ion Source
Ion Source
General Classification
2. Close Source Ion
Main Advantage:
The combination of direct sampling and
differential pumping provides the potential
for PPM and sub-PPM detection limits for
even the most pervasive residual gases.
reduces the visibility of spectral overlaps
ESD impurities are reduced
Features
used when limited quantities of
sample gas are present
suppressed the signal background
generated by residual gas (interference
prevention)
analysis is performed at an ion
source pressure that is up to three
orders of magnitude higher
avoid contamination because the
filament is not in direct contact with
sputtering process
Summary
Ionization
High energy thermionic electrons colliding a neutral atom or complex molecule result to
ionization; the process is called electron bombardment.
The ionization can be single, multiple, or fractional.
Filaments
Tungsten (W 18000C), Rhenium (Re 18000C), Yttriated iridium (Y2O3/Ir 13000C) have
different range of applications.
Ion Sources
Open Ion source - for high-vacuum residual gas analysis; high sensitivity and good linearity
Axial Ion Source
Lattice Ion Source
Crossbeam Ion Source
Close Ion Source - low vacuum application; minimized background and process interference.
Gas-tight Ion Source
Sputter Process Monitor Ion Source
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