TOMMI JAYA SURBAKTI

2714100093
KARAKTERISASI MATERIAL B

Macroetchant for polymer

Material

Etch composition

Phenol
Formaldehyde

75 mL dimethyl sulfoxide
25 mL HNO,

Remarks

Immerse sample 4 h at 7580C. Rinse with water,

then acetone, and dry
(Gaulin and Richardson

Macroetchants for refractory metals

Material
Molybdenum
Tungsten
Vanadium
Niobium
Tantalum

composition
30 mL HC1
15 mL HNO.,
30 mL HF

Remarks
Immerse samples in
solution for 5-20 min at
room
temperature.

Molybdenum
Tungsten
Vanadium

15 mL HF
35 mL HN03
75 mL H2 0

Tungsten
Vanadium
Niobium
Tantalum

10 mL HF
30 mL HNO,
50 mL lactic acid

Immerse sample in solution

at room temperature for 140
min.

Chromium

10 mL H2S04
90 mL H2 0

Immerse sample in boiling

solution for 2-5 min.

Chromium
plating

120-240 g NaOH
3.75-15 g potassium
pyrophosphate
1000 mL H,0

Electrochemical reverseetch process for detecting

abrasive
grinding of hard Cr plating
developed by Grumman
Aerospace Corp. Use for Cr
plating on high-strength
steel. Use electrolytically at
room temperature at 12 V
dc, 0.62 A/cm2, 45 s
(Messier and Mailer).

Immerse samples in
solution at room
temperature for 1020 min.

Composite Material
Vacuum cathodic etching is particularly well suited for materials that are
difficult to etch chemically and for composite materials in which no one etch or

combinations of etchants can reveal the structure of the different materials

present.Vacuum cathodic etching has proved useful for developing the
microstructures of aluminum and cast iron. In steels, the sputtering rates for
ferrite and cementite are nearly identical; thus the technique offers no
advantage over chemical etchants for steels. However, with composite materials,
coatings, dissimilar welds, etc., it is often difficult to completely reveal the
structure by chemical etching.
One component may be satisfactorily etched, while the other is unaffected
or overetched. Vacuum cathodic etching is quite useful for revealing the
structure of metals that are difficult to etch and has been used on radioactive
materials and on ceramics. The etches are stain-free, and fine polishing
scratches are removed. Disadvantages of this method are that samples mounted
in plastics are unsuitable, since the glow discharge will decompose the plastic
and produce contaminating films on the surface. Considerable heat can be
generated during etching. Ion-bombardment etching of low-melting-point metals
can produce cone-shaped artifacts on the etched surface. Cone formation seems
to be more
common when argon or neon gases are used. Thus, it can be difficult to interpret
the microstructure when such features are present. Boundaries between phases
with different removal rates can be widened unnaturally. Surfaces etched by ion
bombardment usually exhibit a flat etch contrast. Grain and phase boundaries
are revealed strongly, Usually requires 1 to 10 min, although times of up to an
hour are sometimes used. An expensive apparatus is also required.

Mineral Material
Etching and staining procedures have been used by mineralogists as
one of several tools for identifying minerals. Etching can be followed by
point counting to determine the amount of specific minerals in a sample.
Etching and staining have also proved useful for illustration purposes,
since the grains of interest are rendered more distinct on a
photomicrograph. Etching has also been used to study the structure of
minerals. Two basic approaches to mineral identification using etchants
have evolved. The procedure used in the United States, which is described
by Davy and Farnham and by Short , is based on the reaction of a sample
to a standard set of reagents. In this method, a drop of a particular
reagent is applied to the sample on the stage of a microscope, and the
action of the etchant is viewed optically for 1 min from the time of
application.
If no reaction occurs during this period, the test is negative. The
reaction is termed positive if any of the following effects are observed:
effervescence, staining, tarnishing, corrosive attack (darkening, pitting, or
structure development), or staining around the edge of the drop. If a
reaction begins at the end of the 1-min period, the results are followed.
After etching, the surface is washed with a jet of water, and the wet
surface is examined to detect any effects obscured by the droplet. This
step is necessary with some of the standard etchants in which the color of
the drop makes examination difficult. For best results, the drop of etchant
should cover only a single grain.
The use of etchants to identify minerals is not simple, and test
results from the use of etchants must be viewed with caution. These

procedures must be used along with other methods. Because mineral

compositions do vary, etch response can also vary. In addition, it has been
observed that minerals can produce both positive and negative responses
to a given etchant. The method is most useful with coarse-grained
minerals, since the droplet cannot be confined to a single grain in finegrained specimens. The etch test method does not appear to be useful
with some types of minerals, e.g., oxide and silicate ores.
Thus, for positive identification, etch test results must be combined
with other optical and physical tests. The second etch test approach,
which is based on the work of Van der Veen, Scheiderhohn, and Ramdohr ,
uses a large number of reagents. Those reagents that give highly specific
reactions are employed for identification. However, in this procedure the
main purpose of the etch is to reveal the textural details, e.g., twinning,
zonal growth, and deformation textures. These features are best revealed
by etching in a manner similar to metallographic etching. The cited
references should be consulted for additional detail. Sasaki et al. Have
published etching response procedures for identifying minerals in blastfurnace and basic-oxygen-furnace slags .