FD-SOI Technology J. Le Coz1, B. Pelloux-Prayer1, B. Giraud2, F. Giner1, P. Flatresse1 1 STMicroelectronics, Crolles, France 2 CEA-LETI-MINATEC, Grenoble, France
julien.le-coz@st.com
1. UTBB 28nm FD-
FD-SOI Technology parasitic junction leakage currents when the device is ON as Ultra-Thin Body and Box (UTBB) Fully Depleted shown in fig 1. Silicon-On-Insulator (FD-SOI) Technology has become This specific UTBB FD-SOI transistor enables a reduction mainstream in the industry with the objective to serve a wide of the unitary power switch Ron by more than 20% (VDD<1.1V), spectrum of mobile multimedia products [1]. Transistors (fig 1) with respect to the classical FD-SOI solution (fig 4). Thereby, are fabricated in a 7nm thin layer of silicon sitting (Tsi) over a with the DTMOS solution designed with VDD=1V10%, the 25nm buried oxide (Tbox). Thanks to its better electrostatic number of power switch (Nsw) composing the network can be control [2]; UTBB FD-SOI technology brings a significant reduced by 20% for the same total Ron. Furthermore, improvement in terms of performance and power saving, compared to its 28 nm BULK counterpart, Ron of the FD-SOI complemented by an excellent responsiveness to power DTMOS is reduced by 35% for a 1.1V power supply. management design techniques for energy efficiency A digital block based on Low Density Parity Checker, optimization. However, looking for a steady increase in LDPC, commonly used in wifi applications [5][8] has been performance for a voltage supply value constantly lowered with implemented in silcon in order to compare and validate the 3 the evolution of technologies, BULK or FD-SOI, involves a power switch options, classical BULK, classical FD-SOI and decrease in the threshold voltage (Vt) and leads to an increase DTMOS FD-SOI. of the stand-by leakage current, requiring the implementation When OFF, the power switch solution, whathever the of a leakage current reduction technique. technology considered, exhibits more than 3 decades leakage reduction, demonstrating the efficiency of power switch design 2. Power Switch Technique technique. The UTBB FD-SOI DTMOS power switch solution Among low-power design solutions, the power switch (PS) appears as most efficient approach: with 20% less Nsw, it design technique [3][4] (fig 2) appears as the most efficient in shows a Ioff current 40% lower than the classical FD-SOI terms of leakage current reduction. The two main parameters When ON and at same speed [5], the LDPC in LVt BULK to be taken into account are the equivalent resistances in ON with a FBB of 300mV is supplied at 1V when the LVt FD-SOI is and OFF states, respectively Ron and Roff. Ron creates a supplied at 0.8V (-20%) and the flip-well LVt FD-SOI LDPC is voltage drop (Vdrop), whereas the leakage current of the logic supplied at 0.7V (-30%). In the last condition, the Iddq of the circuit in a quescient state (Iddq) is reduced in OFF mode to a flip-well LVt FD-SOI LDPC is around two times lower than the lower value (Ioff) equals to VDD/Roff. The higher Roff/Ron Iddq of LVt BULK LDPC. Moreover, when OFF and compared to ratio, the better the solution. As demonstrated in [4], it is the classical power switch BULK solution, the Ioff of the important to notice the power switch network area must also classical FD-SOI solution is 21 times lower and is divided by 35 be taken into account. with the DTMOS FD-SOI solution, as illustrated fig 5 and In the present work, the power switch has been derived in summarized in table 1. two versions associated to a flip-well low-Vt (LVt) logic block, The wake up time (fig 6) is similar for the 3 solutions. Even as describe in [5]. Both versions use specific PMOS into NWELL if the DTMOS FD-SOI solution has 20% less power switches transistor enabling wide voltage range on the gate [0V-VVDIO because can drive 25% more current than classical FD-SOI 1.8V] and therefore super cut-off when OFF [6]. The first version solution ; the wake-up time is defined by the controller which is based on a classical power switch solution while the second provides a current on VDDI maintaining a constant ramp on one is based on a Dynamic Threshold MOS transistor, also VDDI rise, for VDD > 0.7V in FD-SOI and VDD > 0.8V for BULK. called DTMOS or BIMOS [7] (fig 3). When comparing the two 3. Conclusion approaches, the DTMOS exhibits a higher Roff/Ron ratio induced by the dynamic extended Body Biasing (BB) thanks to In conclusion, a power switch solution is mandatory with the direct gate-to-body conection: Forward (FBB) when ON - low-Vt logic. The FD-SOI DTMOS power switch solution, for reducing Ron - and Reverse (RBB) when OFF (Vbs=VDDIO- same equivalent Ron and wake-up time, outperforms the VDD>0) - increasing Roff. The DTMOS solution is only classical FD-SOI solution, leading to 20% less area and 40% of applicable in SOI because the drain and source are isolated leakage reduction. Compared to BULK at same speed, Ioff is from the well thanks to the buried oxide eliminating the divided by 35. This solution has been validated on silicon through a circuit designed using an industrial design flow.
978-1-4799-1361-9/13/$31.00 2013 IEEE
figure 4 : Unitary power switch Ron of the 3 solutions at 30C in typical
figure 1 : BULK and FD-SOI PMOS & Conventional and Flip well configuration
figure 5 : Power switch Ioff current of the 3 solutions at 30C in typical
figure 2 : Power switch library description
figure 6 : Power switch wake-up time of the 3 solutions at 30C in typical
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