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AND CONTROL
Dr. S. Meenatchisundaram
Email: meenasundar@gmail.com
H1 = /R
Where, R = 1/QCs which is defined as the Thermal Resistance.
Change in heat storage rate is given by
H2 = MCs d/dt
Where
M = mass of the liquid in the tank
d/dt = rate of rise of temperature in the tank
H2 = C d/dt
Where
C = MCs which is defined as Thermal Capacitance.
Process Instrumentation and Control (ICE 401)
Dr. S.Meenatchisundaram, MIT, Manipal, Aug Nov 2015
Thermal Systems:
H= H1 + H2
The mathematical model of a thermal system shown in
figure is d
H= +C
R dt
Applying Laplace transform
( s )
H(s)= + Cs ( s )
R
1
= + Cs ( s )
R
1 + RCs ( s ) R
= ( s ) = 1 + RCs
R H(s)
Process Instrumentation and Control (ICE 401)
Dr. S.Meenatchisundaram, MIT, Manipal, Aug Nov 2015
References: