Carbon Thin Film Deposition on a Quartz Crystal Microbalance Sensor by

D.C. magnetron sputtering

E.M. Dumayaca, M. Kitagawa, T. Misu G. Saquilayan, M. Wada

Graduate School of Science and Engineering, Doshisha University,

Kyotanabe, Kyoto 610-0321, Japan
Corresponding author: E.M. Dumayaca, e-mail address: dup3303@mail4.doshisha.ac.jp

PACS: 81.15.Cd, 68.55.J, 68.55.jd

Majority of modern ion engine thrusters use xenon (Xe) ions as the propellant. Ion
bombardment erodes grids via sputtering process and the endurance against Xe ions makes
carbon as the material most appropriate for ion extraction grids.

Therefore, information on erosion rates of carbon grids due to sputtering by Xe ion

bombardment is critically important to estimate life of these ion thrusters. Sputtering yields of
carbon under Xe ion bombardment has already been numerically calculated [1].

The result needs experimental confirmation, and an apparatus that measures sputtering yield of
carbon by Xe ion incidence is currently being assembled. In this apparatus, Xe ion beam is
mass-separated by a magnetic momentum analyzer, and the magnitude of the ion beam
reaching the carbon target is below 1 microampere. The mass reduction of the target is
extremely small. It is for this reason, that a carbon thin film is deposited on a quartz crystal
microbalance (QCM) sensor to detect mass reduction of the film by Xe ion sputtering.

The thin carbon layer on the sensor is fabricated through DC magnetron sputtering. Upon ion
bombardment on the target, the change in the oscillation frequency of the QCM will determine
the amount of carbon removed from the thin film target.

Preliminary experiments using glass slides and micro cover glasses as substrates were
performed to determine the value of the sputtering deposition parameters appropriate for the
carbon deposition. Plasma operation at 0.25 A discharge current and 2.0 Pa Ar gas pressure
formed films with 120 min deposition time. Insufficient heat transfer to the plasma chamber
and inhomogeneous temperature distribution on the substrate holder were resolved to facilitate
the homogenous deposition of carbon across the substrate. In addition, the substrate
temperature is to be kept low to minimize the loss in the electrical polarization of the QCM
sensor at elevated temperature, and a cooling system was designed and installed. The decrease
of target temperature caused the insufficient deposition speed of carbon onto the target
resulting in the erosion of silver coating on the target due to Ar ion bombardment.

The film morphology can be complicated as it resembles the condition of ion beam assisted
deposition. X-ray diffraction (XRD) will measure the film thickness as well as the crystalline
structure. Depending upon plasma potential, energetic ions can produce blistering structures
which should be avoided for a target for sputtering measurement. The film’s morphology will
be investigated through scanning electron microscope (SEM) observation to see if pores due to
blistering process appear near the surface of deposited carbon layer on the QCM sensor.